Technology & Engineering for Thin Film Applications

         >> PLASMA-POWER Solutions and Consulting <<


MICROWAVE PLASMA

Microwave technology is continuously finding new applications in plasma laboratories and industries due to the many advantages of microwave plasmas, e.g. particularly dense plasma - ions and active species, electrode less, operation over a wide range of pressures. Microwave-assisted plasmas find applications in diamond deposition, surface activation, sterilization, synthesis of nanomaterials, gas cleaning etc.


Sources   -   Generators   -   Reactors




Plasma Sources

Downstream plasma source – 2.45 GHz

Surfaguide plasma source – 2.45 GHz

S-Wave plasma source – 2.45 GHz

Aura-Wave ECR Coaxial plasma source – 2.45 GHz

Hi-Wave collisional plasma source – 2.45 GHz

ICP plasma source – 13.56 MHz and 27.12 MHz


Please contact us for more details.