Microwave technology is continuously finding new applications in plasma laboratories and industries due to the many advantages of microwave plasmas, e.g. particularly dense plasma - ions and active species, electrode less, operation over a wide range of pressures. Microwave-assisted plasmas find applications in diamond deposition, surface activation, sterilization, synthesis of nanomaterials, gas cleaning etc.
Sources - Generators - Reactors
Downstream plasma source – 2.45 GHz
Surfaguide plasma source – 2.45 GHz
S-Wave plasma source – 2.45 GHz
Aura-Wave ECR Coaxial plasma source – 2.45 GHz
Hi-Wave collisional plasma source – 2.45 GHz
ICP plasma source – 13.56 MHz and 27.12 MHz
Please contact us for more details.