Cathodic - ARC
Pulsed ARC-Supplies for Cathodic ARC-Evaporation
made by J.Schneider
- optimized for “droplet free” (or close to..) ARC / pulsed ARC processing
- true Current Source CFPP (Current Fed Push Pull) -Technologie
- smallest footprint
- 12KW up to 400A, single box, 3/6KW; 100/200A in project
- Custom Supplies available
Pulsed Product Performance -Improvements shown and reported on:
- less droplets -> smoother surface
- better control of film properties
- higher deposition rate, shorter cycle time
- higher target utilisation
Bias Power Systems
The PLASMATEC BIAS Unipolar / Bipolar outout from 20 up to 1000 V.
7.5 or 15 kW. (In parallel mode the power can be increased to 45KW)
- unipolar output frequency of 1 to 30 kHz
- bipolar output frequency is adjustable from 1 to 15 kHz.
- duty cycle from 1 to 95 %
- Positive and negative pulses have the same output voltage but the duty cycle can be adjusted separately.
The PLASMATEC BIAS supplies feature:
- a sophisticated flexible adjustable arc management
- a high power density and an incomparable robustness.
- Optimized for pulsed ion etching
- Better film density and adhesion
- Adaptable to a wide range of process requirements
- Water-cooled
- Multiple units combinable for high power requirements
- High performance DSP regulator
Pulse Form ARC
Pulse Form Bias
NEW ARC