Cathodic - ARC 

Pulsed ARC-Supplies for Cathodic ARC-Evaporation

made by J.Schneider

• optimized for “droplet free” (or close to..)  ARC / pulsed ARC  processing
• true Current Source CFPP  (Current Fed Push Pull) -Technologie
• smallest footprint
• 12KW up to 400A, single box, 3/6KW; 100/200A in project
• Custom Supplies available

Pulsed Product Performance -Improvements shown and reported on:

• less droplets -> smoother surface
• better control of film properties
• higher deposition rate, shorter cycle time
• higher target utilisation

Bias Power Systems

The PLASMATEC BIAS Unipolar / Bipolar outout   from 20 up to 1000 V.

 7.5 or 15 kW. (In parallel mode the power can be increased to 45KW)

• unipolar  output frequency of 1 to 30 kHz
• bipolar output frequency is adjustable from 1 to 15 kHz. 
• duty cycle from 1 to 95 % 
• Positive and negative pulses have the same output voltage but the duty cycle can be adjusted separately.

The PLASMATEC BIAS supplies feature: 

• a sophisticated flexible adjustable arc management
• a high power density and an incomparable robustness.
• Optimized for pulsed ion etching
• Better film density and adhesion
• Adaptable to a wide range of process requirements
• Water-cooled
• Multiple units combinable for high power requirements
• High performance DSP regulator

Pulse Form ARC

Pulse Form Bias