Pulsed ARC-Supplies for Cathodic ARC-Evaporation 

made by J.Schneider   

• optimized for “droplet free” (or close to..)  ARC / pulsed ARC  processing
• true Current Source CFPP  (Current Fed Push Pull) -Technologie
• smallest footprint
• 12KW up to 400A, single box, 3/6KW; 100/200A in project
• Custom Supplies available

First industrial Test Results have been evaluated,

Improvements shown and reported on:

• less droplets -> smoother surface
• better control of film properties
• higher deposition rate, shorter cycle time
• higher target utilisation