See our Publications / Papers / Application Info
 | Appl Note 202008-001.pdf (189.01KB) |
| Appl Note 202008-001.pdf (189.01KB) |
New Plasma Power Supply Technologies with adjustable positive pulsing for Flexible-Bendable-Adhesive Metal Coatings on temperature sensitive materials for AM (additive manufacturing) or medical applications.
Industrial use of HiPIMS, up to now and a glance into the future. A review by a manfacturer. Introduction of the hiP-V hiPlus technology.
THE INTRODUCTION OF ASSYMETRICALL UNIPOLAR PULSED HIPIMS.
| Appl Note 202010-002.pdf (125.45KB) |
| Appl Note 202010-002.pdf (125.45KB) |
New Plasma Power Supply Technologies with Positive Reverse Pulsing. Increased Film Density for Magnetron Sputtering for conductive and on non-conductive substrates
| HiPIMS Puls Article.pdf (114.37KB) |
| HiPIMS Puls Article.pdf (114.37KB) |
HiPIMS with positive reverse pulsing.
A technical essay by Gerhard Eichenhofer
| IFB Sputter Paper Surf Coat.pdf (8.1MB) |
| IFB Sputter Paper Surf Coat.pdf (8.1MB) |
IFB Application and limitations of
inverted fireballs in a magnetron sputter device
IFB Measurement of inverted n-hexane fireball properties with a Multipole Resonance Probe
IFB Applicaion deposition of carbon films with extremely low surface roughness
HiPIMS Conf. 2016. The first introduction of the positive reverse pulse in HiPIMS.
Vorteile durch gepulste Verdampfung, Magazin für Oberflächentechnik 2023-01